Preparation of Schiff Bases Derived from Chitosan and Investigate their Photostability and Thermal Stability

Document Type : Regular Article

Authors

1 Department of Chemistry, College of Science, Tikrit University, Tikrit 34001, Iraq

2 Department of Chemistry, College of Science, Al-Nahrain University, 64021 Baghdad, Iraq

3 Faculty of Applied Sciences, Universiti Teknologi MARA, Shah Alam 40450, Selangor, Malaysia

10.22036/pcr.2022.333808.2051

Abstract

This study intends to synthesize Schiff bases derived from chitosan and aromatic aldehyde to investigate their photo-stability. The surface morphology and chemical structure of modified polymer were characterized using different techniques such as infrared spectroscopy (FTIR), scanning electron microscope (SEM), microscopic images, atomic force microscopy (AFM), and energy dispersive X-Ray (EDX) mapping. The thermal stability of synthesized materials was determined using thermogravimetric analysis (TGA). The modification in the chemical structure and morphology of new Schiff bases were verified using FT-IR, NMR, AFM, and SEM, whereas the thermal properties were investigated by TGA. Thus it was demonstrated that the thermal stability of chitosan has improved after the modification with the corresponding aldehyde. The decomposition temperature (Td) of pure chitosan is about 220 °C while it is between 250-256 °C for modified Schiff bases. Two approaches were applied to investigate the physical photo-stability of modified chitosan the weight loss percentage, and monitoring of the functional group by FTIR. The weight loss percentages of blank films are much higher than modified chitosan polymeric films. This is because the photo-degradation of blank chitosan is faster when irradiated by UV light.

Graphical Abstract

Preparation of Schiff Bases Derived from Chitosan and Investigate their Photostability and Thermal Stability

Keywords

Physical Chemistry Research
Volume 10, Issue 4 - Serial Number 36
December 2022
Pages 549-557

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History

  • Receive Date: 12 March 2022
  • Revise Date: 10 April 2022
  • Accept Date: 12 April 2022

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